A Brief History of Cathodic Arc Coating.- The Physics of Cathode Processes.- The Interelectrode Plasma.- Cathodic Arc Sources.- Macroparticles.- Macroparticle Filters.- Film Deposition by Energetic Condensation.- Reactive Deposition.- Some Applications of Cathodic Arc Coatings.
André Anders is a Senior Scientist and the Leader of the Plasma Applications Group at Lawrence Berkeley National Laboratory in Berkeley, California. He published his first paper on discharges in vacuum in 1984 and has worked in related fields ever since, first with his mentors Burkhard Jüttner and Erhard Hantzsche in East Berlin, Germany, and since 1992 in Berkeley, California. With over 200 publications in refereed journals, he contributed to the field of cathodic arcs and arc-based coatings by extensive measurements of arc plasma properties and the development of miniaturized filtered arc systems for diamond-like carbon, which are today used by the magnetic storage industry. He currently serves in many committees, most notably as the Chairman of the Permanent International Scientific Committee of the Symposia on Electrical Insulation and Discharges in Vacuum.
With great interest I learned that the Springer Scientific
Publisher has published a monograph entitled "Cathodic Arcs: From
Fractal Spots to Energetic Condensation" by Dr. Anders, Leader of
the Plasma Applications Group at Lawrence Berkeley National
Laboratory, a scientist noted as an expert in physics of vacuum
discharges and in discharge-assisted coating deposition
technologies. Being closely acquainted with a great number of
articles and reviews authored by him and co-authored with
scientists from different countries who come to Berkeley to execute
research work, I anticipated that such a book would just about to
appear because the great body of data amassed by Dr. Anders
strongly called for integration. My expectations have been
realized, and I would like to express my sincere congratulations to
Dr. Anders on the occasion of the appearance of this book. At first
glance the book’s title looks somewhat unusual because all of us,
the scientists engaged in this field of physics, has got used to
the term "vacuum arc", specifying the arc type by some additional
words. It seems that the author uses the term "cathodic arc" to
stress that we are dealing with a vacuum arc (or an arc in a
low-pressure working gas) during which the working medium is
supplied to the discharge gap only by cathode spots. The plasma
flow produced from this conducting medium is transferred through a
plasma-optical system, which eliminates macroparticles, and
eventually it settles on a substrate to form a cathode material
coating. I believe that there are all grounds to accept the term
"cathodic arc" because it simplifies the description of the
phenomenon by treating it as a sequence of events from the
initiation of cathode spots and generation of cathode plasma to the
settlement of cathode plasma ions on the substrate. This is exactly
what the author has done by considering the whole sequence of
events from both the physical and the technical viewpoint. This
consideration ispreceded by a detailed more than two-century
background of this problem. In my opinion, the book is a
contemporary encyclopedia in the physics, engineering, and
technology of vacuum (cathodic) arcs and in their use for coating
deposition to which the author has made a great contribution. The
appearance of this book is an important step toward the advance in
high current vacuum electronics and in its up-to-date technological
applications. I should like to wish the author further advances in
his research work. Professor Dmitry I. Proskurovsky
Institute of High Current Electronics
Russian Academy of Sciences, Siberian Division
Tomsk, 634055, Russia
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