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Presents a precise understanding of various CMOS devices and the unprecedented etching issues encountered in the microelectronics industry

Table of Contents

1. CMOS Devices Through the Years 2. Plasma Etching in Microelectronics 3. Patterning Challenges in Microelectronics 4. Plasma Etch Challenges for Gate Patterning

About the Author

Nicolas Posseme is a Senior Research Scientist in MIcrotechnologie & Nanotechnology and Deputy Head of Plasma Etching & Stripping in the Silicon Technologies division at the CEA-LETI Laboratory in Grenoble, France.